Datasets:

Taylor658
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SiN-photonic-waveguide-loss-efficiency

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train · 90k rows

waveguide_width float32 0.5 2	waveguide_height float32 200 600	cladding_material stringclasses 3 values	cladding_thickness float32 1 5	deposition_method stringclasses 3 values	etch_method stringclasses 3 values	sidewall_roughness float32 0.5 5	annealing_params stringclasses 4 values	wavelength float32 1.5k 1.6k	polarization stringclasses 2 values	input_power float32 -10 10	temperature float32 20 80	bend_radius float32 20 200	device_length float32 1 50	insertion_loss float32 0.53 26.5	propagation_loss float32 0.1 5	coupling_efficiency_input float32 40 90	coupling_efficiency_output float32 40 90	scattering_loss float32 0.01 0.5	effective_index float32 1.5 2	mode_confinement_factor float32 0.7 0.95	batch_id stringclasses 50 values	data_source stringclasses 2 values	measurement_method stringclasses 4 values	uncertainty float32 0.01 0.2
1.601	282.049988	SiO2	4.18	PECVD	Wet Etch	0.68	900C_3hr	1,557.75	TM	7.14	44.349998	148.509995	9.06	2.062	0.679	56.5	88.059998	0.223	1.656	0.892	BATCH_29	Synthetic	cut-back	0.083
0.69	431.670013	SiO2	2.53	PECVD	Wet Etch	4.63	900C_3hr	1,523.97998	TE	-8.46	47.889999	182.75	43.240002	18.893999	4.098	61.16	48.259998	0.411	1.532	0.874	BATCH_7	Measurement	microring_Q	0.175
0.74	528.01001	Air	2.14	PECVD	RIE	3.16	No_Anneal	1,540.339966	TM	-7.24	41.279999	143.570007	2.82	2.762	3.878	71.610001	59.259998	0.181	1.707	0.703	BATCH_50	Synthetic	OTDR	0.149
0.593	410.170013	Polymer	3.56	PECVD	ICP	2.77	1000C_1hr	1,566.25	TE	-0.43	41.549999	184	9.77	5.412	3.947	84.870003	74.959999	0.128	1.89	0.88	BATCH_8	Synthetic	OTDR	0.191
1.395	589.400024	SiO2	1.44	PECVD	RIE	1.88	No_Anneal	1,556.969971	TM	3.07	23.33	129.679993	42.849998	3.334	0.368	58.439999	63.73	0.201	1.786	0.93	BATCH_8	Synthetic	microring_Q	0.113
0.823	310.25	Polymer	1.42	PECVD	RIE	1.31	1000C_1hr	1,589.849976	TM	4.87	60.189999	23.370001	2.67	2.535	4.85	76.75	89.029999	0.264	1.856	0.777	BATCH_11	Synthetic	OTDR	0.172
1.212	404.980011	Polymer	3.18	LPCVD	Wet Etch	1.19	No_Anneal	1,565.420044	TE	-6.61	40.580002	188.690002	48.16	19.431	3.805	84.760002	53.810001	0.461	1.685	0.938	BATCH_30	Measurement	cut-back	0.114
1.534	268.170013	SiO2	1.39	PECVD	ICP	1.96	1000C_1hr	1,538.420044	TM	3.73	73.489998	58.790001	42.34	9.383	1.767	69.410004	87.769997	0.366	1.991	0.937	BATCH_50	Synthetic	ring_resonance	0.062
1.317	597.559998	SiO2	1.85	Sputtering	ICP	4.84	900C_1hr	1,565.060059	TE	-5.84	54.759998	177.229996	32.43	12.027	3.53	53.209999	66.389999	0.089	1.552	0.789	BATCH_48	Synthetic	OTDR	0.126
1.54	591.47998	Air	2.55	PECVD	ICP	2.52	900C_1hr	1,561.170044	TM	9.66	46.110001	54.240002	10.17	5.518	4.429	50.5	85.190002	0.33	1.664	0.842	BATCH_2	Synthetic	microring_Q	0.13
1.13	381.359985	SiO2	4.58	PECVD	Wet Etch	1.56	900C_1hr	1,529.449951	TM	-2.21	61.25	67.260002	30.33	6.171	1.758	75.010002	82.459999	0.024	1.888	0.87	BATCH_40	Synthetic	OTDR	0.18
1.928	330.829987	Polymer	3.98	PECVD	Wet Etch	2.93	No_Anneal	1,584.219971	TM	3.66	57.639999	199.919998	8.5	3.287	1.75	42.209999	45.349998	0.195	1.852	0.782	BATCH_15	Measurement	OTDR	0.091
1.994	308.369995	Air	4.72	PECVD	RIE	1.91	1000C_1hr	1,547.77002	TM	-2.51	58.5	145.479996	33.220001	7.735	1.737	61.419998	52.139999	0.088	1.847	0.723	BATCH_30	Synthetic	ring_resonance	0.176
1.375	468.709991	Polymer	1.53	LPCVD	Wet Etch	0.73	No_Anneal	1,576.22998	TE	-6.52	43.369999	58.790001	45.529999	9.93	1.906	85.260002	40.259998	0.072	1.869	0.745	BATCH_13	Measurement	microring_Q	0.034
1.251	392.959991	Air	3.84	PECVD	Wet Etch	1.65	900C_3hr	1,587.51001	TE	9.2	72.07	144.210007	42.330002	19.771	4.301	57.09	60.66	0.333	1.608	0.745	BATCH_38	Synthetic	OTDR	0.107
1.791	372.570007	Polymer	3.66	LPCVD	RIE	0.95	900C_3hr	1,592.920044	TM	9.86	36.060001	106.43	26.9	5.478	1.537	87.650002	74	0.15	1.808	0.831	BATCH_24	Synthetic	cut-back	0.194
0.631	549.960022	Polymer	1.32	PECVD	Wet Etch	3.36	No_Anneal	1,503.449951	TE	4.51	39.709999	54.490002	34.970001	6.273	1.356	67.660004	44.299999	0.412	1.812	0.843	BATCH_15	Synthetic	ring_resonance	0.075
0.659	302.869995	Air	4.69	PECVD	ICP	4.7	1000C_1hr	1,542.300049	TE	1.94	31.889999	190.580002	22.969999	10.629	4.159	65.910004	45.139999	0.464	1.792	0.933	BATCH_4	Synthetic	OTDR	0.016
0.803	545.140015	Polymer	4.67	Sputtering	RIE	3.56	900C_3hr	1,555.829956	TE	7.19	53.18	173.710007	20.5	1.55	0.249	61.73	66.080002	0.232	1.791	0.758	BATCH_7	Measurement	ring_resonance	0.111
1.285	380.279999	Polymer	4.48	PECVD	RIE	3.36	900C_3hr	1,550.650024	TE	9.16	23.559999	125.239998	19.1	6.012	2.392	87.459999	70.550003	0.154	1.608	0.795	BATCH_33	Measurement	OTDR	0.136
1.44	556.570007	Air	2.74	Sputtering	RIE	3.22	900C_3hr	1,595.550049	TM	1.76	67.690002	188.020004	24.92	8.128	2.529	61.810001	52.459999	0.372	1.781	0.916	BATCH_7	Measurement	OTDR	0.023
1.175	532.51001	Air	4.61	LPCVD	RIE	4.35	900C_1hr	1,555.459961	TE	-5.69	35.540001	137.440002	5.99	2.797	3.49	58.73	76.5	0.492	1.932	0.767	BATCH_46	Synthetic	cut-back	0.059
0.608	468.049988	SiO2	1.16	Sputtering	ICP	3.25	900C_1hr	1,564.390015	TM	-5.66	53.02	27.190001	29.540001	9.898	3.023	50.27	69.669998	0.232	1.551	0.713	BATCH_3	Measurement	cut-back	0.015
0.528	224.059998	SiO2	1.58	Sputtering	RIE	4.41	900C_1hr	1,558.25	TE	5.72	47.43	164.820007	44.919998	9.618	1.969	77.580002	83.339996	0.146	1.697	0.884	BATCH_45	Measurement	OTDR	0.103
0.51	503.720001	Polymer	4.86	PECVD	Wet Etch	3.59	1000C_1hr	1,514.859985	TE	7.36	55.41	53.759998	13.21	3.02	0.928	80.18	69.970001	0.297	1.648	0.935	BATCH_29	Measurement	ring_resonance	0.039
1.784	363.149994	Polymer	2.28	LPCVD	Wet Etch	2.32	1000C_1hr	1,591.119995	TE	-7.74	32.119999	132.690002	16.49	7.753	4.257	49.560001	58.419998	0.381	1.929	0.777	BATCH_15	Measurement	OTDR	0.106
0.669	554.700012	Polymer	1.66	PECVD	Wet Etch	0.92	900C_1hr	1,547.25	TE	8.96	26.450001	28.209999	35.209999	14.656	3.689	80.68	75.580002	0.407	1.954	0.856	BATCH_22	Synthetic	microring_Q	0.146
1.698	398.100006	Polymer	4.04	Sputtering	RIE	3.14	900C_3hr	1,512.410034	TE	-2.6	28.030001	22.030001	32.16	15.881	4.341	81.43	64.050003	0.438	1.724	0.733	BATCH_42	Synthetic	OTDR	0.113
1.386	373.980011	Polymer	2.4	LPCVD	ICP	4.78	900C_1hr	1,546.550049	TM	-0.42	48.5	37.59	3.6	1.364	0.615	49.860001	51.110001	0.393	1.962	0.769	BATCH_48	Measurement	OTDR	0.078
1.293	490.269989	SiO2	1.5	Sputtering	RIE	4.63	900C_3hr	1,581.550049	TE	-7.04	67.82	61.139999	40.25	8.717	1.691	66.110001	75.459999	0.265	1.774	0.94	BATCH_17	Measurement	ring_resonance	0.026
1.061	340.910004	SiO2	3.98	LPCVD	Wet Etch	4.1	No_Anneal	1,536.150024	TE	-5.19	71.910004	173.440002	30.26	14.714	4.439	48.889999	52.389999	0.055	1.766	0.835	BATCH_2	Measurement	microring_Q	0.105
1.389	277.23999	Polymer	3.72	Sputtering	Wet Etch	1.72	No_Anneal	1,587.550049	TE	9.26	78.709999	123.970001	6.17	3.765	4.104	81.559998	86.970001	0.09	1.853	0.736	BATCH_28	Measurement	microring_Q	0.136
1.172	509.820007	Polymer	4.46	Sputtering	RIE	2.33	900C_1hr	1,502.300049	TM	-1.84	29.549999	65.949997	16.809999	7.442	3.791	40.490002	81.470001	0.351	1.554	0.752	BATCH_9	Measurement	ring_resonance	0.183
1.313	529.719971	SiO2	3.68	Sputtering	Wet Etch	0.93	900C_1hr	1,533.930054	TM	-3.2	45.310001	34.799999	46.16	22.896	4.796	51.23	69.889999	0.216	1.906	0.935	BATCH_36	Measurement	ring_resonance	0.107
0.936	484.73999	SiO2	4.06	LPCVD	RIE	1.18	No_Anneal	1,583.689941	TM	-7.43	42.25	124.220001	19.33	3.12	0.587	89.160004	64.019997	0.179	1.955	0.912	BATCH_5	Measurement	ring_resonance	0.054
1.358	404.140015	Air	1.37	LPCVD	Wet Etch	4.37	900C_3hr	1,517.72998	TM	-1.22	51.759998	48.709999	13.15	5.438	3.108	61.189999	43.830002	0.481	1.601	0.754	BATCH_26	Measurement	microring_Q	0.129
0.6	386.73999	Air	1.86	Sputtering	ICP	4.3	No_Anneal	1,593.98999	TE	-4.76	29.559999	198.869995	35.77	10.849	2.541	74.830002	67.410004	0.357	1.833	0.934	BATCH_7	Measurement	ring_resonance	0.061
0.728	411.720001	Air	4.93	Sputtering	ICP	4.5	900C_1hr	1,520.439941	TM	4.85	76.93	109.199997	4.4	1.55	0.22	78.910004	44.73	0.221	1.645	0.771	BATCH_22	Synthetic	ring_resonance	0.075
0.863	380.51001	Air	1.71	LPCVD	RIE	1.6	900C_1hr	1,594.920044	TE	6.99	51.32	22.24	33.52	5.184	1.264	53	61.580002	0.205	1.704	0.848	BATCH_28	Measurement	cut-back	0.199
0.562	287.98999	Polymer	3.99	LPCVD	ICP	3.5	1000C_1hr	1,553.439941	TE	-1.73	77.720001	37.07	15.65	5.672	2.534	77.220001	43.990002	0.235	1.923	0.903	BATCH_3	Synthetic	microring_Q	0.104
1.26	532.789978	SiO2	1.51	Sputtering	RIE	1.84	900C_3hr	1,537.930054	TE	3	70.379997	174.940002	23.219999	7.032	2.678	51.130001	59.619999	0.374	1.99	0.785	BATCH_16	Synthetic	ring_resonance	0.086
1.676	507.059998	SiO2	2.8	PECVD	Wet Etch	4.04	900C_1hr	1,596.180054	TE	-1.34	41.139999	58.990002	42.509998	9.198	1.743	55.580002	88.980003	0.321	1.847	0.795	BATCH_48	Synthetic	OTDR	0.09
1.357	252.970001	Polymer	2.11	LPCVD	ICP	3.5	1000C_1hr	1,506.380005	TM	4.7	30.799999	128.869995	32.59	3.948	0.69	63.919998	57.709999	0.331	1.584	0.93	BATCH_14	Measurement	ring_resonance	0.188
1.554	554.530029	Air	2.26	LPCVD	ICP	1.01	900C_3hr	1,553.579956	TM	-9.66	78.029999	152.479996	23.549999	6.675	2.014	66.669998	89.18	0.314	1.688	0.727	BATCH_41	Measurement	ring_resonance	0.188
1.773	402.420013	SiO2	3.97	Sputtering	Wet Etch	3.73	No_Anneal	1,533.5	TM	-8.09	20.450001	199.809998	25.040001	12.926	4.859	52.709999	45.560001	0.122	1.759	0.896	BATCH_30	Measurement	OTDR	0.104
0.572	203.119995	SiO2	1.91	Sputtering	RIE	4.61	900C_1hr	1,534.75	TE	0.16	49.470001	130.460007	27.51	5.777	1.758	71.360001	41.209999	0.206	1.891	0.803	BATCH_34	Measurement	microring_Q	0.187
0.892	270.329987	Air	3.39	Sputtering	RIE	4.96	1000C_1hr	1,560.099976	TE	8.51	54.73	88.870003	6.33	2.604	2.748	84.400002	65.209999	0.216	1.828	0.888	BATCH_13	Measurement	OTDR	0.03
0.726	227.309998	Polymer	4.72	LPCVD	RIE	3.81	1000C_1hr	1,545.709961	TE	4.3	74.5	142.979996	1.76	2.218	1.493	82.269997	71.980003	0.328	1.82	0.87	BATCH_46	Measurement	ring_resonance	0.169
1.661	575.130005	Air	2.61	Sputtering	RIE	4.93	1000C_1hr	1,583.22998	TE	-7.56	23.299999	156.960007	10.09	5.551	4.231	77.57	89.239998	0.407	1.918	0.94	BATCH_6	Measurement	microring_Q	0.145
1.677	538.080017	Air	2.03	PECVD	Wet Etch	0.95	900C_1hr	1,589.719971	TE	0.54	33.220001	102.330002	46.82	14.335	2.835	67.300003	50.07	0.25	1.742	0.835	BATCH_26	Synthetic	OTDR	0.033
0.528	599.830017	Polymer	3.51	LPCVD	ICP	3.54	1000C_1hr	1,529.25	TE	-7.23	40.630001	152.570007	15.23	4.334	1.799	71.080002	45.57	0.281	1.695	0.724	BATCH_5	Synthetic	OTDR	0.093
0.691	417.320007	Polymer	2.03	LPCVD	RIE	3.83	900C_1hr	1,565.290039	TM	-0.39	66.639999	40.380001	13.73	8.269	4.849	84.209999	41.869999	0.093	1.505	0.915	BATCH_3	Measurement	microring_Q	0.162
0.788	240.869995	Polymer	4.96	PECVD	RIE	3.11	1000C_1hr	1,592.219971	TM	6.04	55.580002	81.82	38.759998	9.395	2.162	58.73	73.080002	0.437	1.721	0.904	BATCH_44	Measurement	ring_resonance	0.107
1.898	254.720001	Air	3.8	Sputtering	RIE	2.42	900C_3hr	1,516.130005	TE	-1.62	38.93	140.440002	3.35	1.443	1.472	43.27	40.639999	0.043	1.815	0.883	BATCH_7	Synthetic	microring_Q	0.144
1.652	398.410004	Air	4.18	LPCVD	RIE	4.7	900C_3hr	1,585.060059	TM	8.81	68.400002	145.610001	2.41	1.804	1.914	77.230003	45.919998	0.379	1.673	0.825	BATCH_41	Synthetic	OTDR	0.093
0.895	318.859985	Air	2.73	Sputtering	RIE	1.1	900C_1hr	1,580.839966	TM	5.32	77.010002	102.760002	27.370001	3.459	0.649	56.639999	62.810001	0.106	1.866	0.781	BATCH_34	Synthetic	OTDR	0.023
1.596	528.179993	Air	1.31	PECVD	RIE	4.16	900C_3hr	1,567.150024	TM	-1.37	61.599998	188.210007	41.23	15.425	3.515	72.739998	57.52	0.494	1.749	0.735	BATCH_3	Synthetic	OTDR	0.065
0.54	518.200012	Air	2.68	LPCVD	ICP	4.95	1000C_1hr	1,524.949951	TM	-0.78	64.5	21.52	38.369999	16.844	4.056	43.790001	70.690002	0.353	1.824	0.905	BATCH_15	Synthetic	OTDR	0.186
1.985	575.650024	Air	1.08	Sputtering	RIE	4.34	900C_1hr	1,571.859985	TE	9.44	58.169998	182.179993	47.889999	16.67	3.093	47.509998	75.589996	0.066	1.838	0.734	BATCH_24	Synthetic	cut-back	0.044
1.377	487.220001	Air	2.45	LPCVD	Wet Etch	0.86	No_Anneal	1,554.290039	TM	-3.35	46.119999	102.639999	39.650002	9.377	2.012	59.880001	48.400002	0.043	1.539	0.825	BATCH_1	Synthetic	microring_Q	0.125
1.255	460.799988	Air	4.69	Sputtering	ICP	2.21	900C_1hr	1,502.619995	TE	1.64	23.09	68.889999	38.200001	10.075	2.315	64	71.129997	0.478	1.652	0.75	BATCH_50	Measurement	OTDR	0.146
1.785	300.820007	SiO2	1.09	LPCVD	ICP	0.86	1000C_1hr	1,551.430054	TE	-5.24	43.93	99.290001	32.869999	2.994	0.31	77.010002	74.300003	0.237	1.812	0.889	BATCH_33	Measurement	microring_Q	0.164
0.627	379.600006	Polymer	4.31	PECVD	Wet Etch	2.4	900C_3hr	1,551.5	TM	1.4	63.279999	49.939999	46.380001	15.459	3.008	86.690002	42.209999	0.219	1.62	0.833	BATCH_7	Measurement	OTDR	0.048
1.801	578.869995	Air	2.33	PECVD	ICP	3.38	1000C_1hr	1,526.359985	TE	-9.16	47.220001	126.529999	44.169998	10.734	2.25	65.629997	62.639999	0.458	1.753	0.811	BATCH_19	Measurement	cut-back	0.08
1.406	478.670013	Polymer	2.61	LPCVD	ICP	1.69	900C_3hr	1,568.790039	TE	5.1	56.889999	89.709999	40.66	11.676	2.438	59.139999	88.360001	0.386	1.744	0.818	BATCH_28	Measurement	OTDR	0.16
0.506	579	Air	4.14	LPCVD	ICP	2.87	1000C_1hr	1,506.540039	TM	-7.25	60.709999	57.990002	5.66	3.284	4.328	44.470001	75.050003	0.231	1.577	0.914	BATCH_11	Synthetic	ring_resonance	0.169
1.674	236.089996	Polymer	1.75	LPCVD	RIE	1.22	No_Anneal	1,517.619995	TM	2.82	28.200001	95.720001	16.549999	4.045	1.915	71.900002	64.529999	0.284	1.781	0.803	BATCH_50	Measurement	OTDR	0.176
1.959	242.309998	Air	2.72	Sputtering	RIE	2.91	1000C_1hr	1,588.699951	TE	0.68	68.029999	54.009998	17.15	6.914	3.441	51.240002	41.470001	0.432	1.985	0.704	BATCH_7	Measurement	ring_resonance	0.182
1.633	352.230011	Air	2.6	LPCVD	RIE	1.21	1000C_1hr	1,575.719971	TM	-7.24	44.950001	154.300003	30.690001	2.166	0.279	44.560001	44.919998	0.114	1.909	0.74	BATCH_43	Synthetic	OTDR	0.069
1.65	427.920013	Polymer	4.28	PECVD	ICP	4.92	900C_1hr	1,514.349976	TM	-3.97	76.849998	25.85	29.209999	15.086	4.609	71.510002	49.73	0.322	1.736	0.873	BATCH_31	Synthetic	microring_Q	0.011
0.982	320.630005	Polymer	4.05	PECVD	ICP	2.35	900C_1hr	1,586.060059	TM	9.55	58.470001	66.120003	1.38	2.184	1.788	67.779999	54.91	0.222	1.65	0.71	BATCH_39	Measurement	microring_Q	0.135
1.229	590.429993	SiO2	2.91	PECVD	Wet Etch	2.14	900C_1hr	1,545.449951	TM	-5.77	44.41	30.65	11.6	3.307	2.066	41.59	48.48	0.052	1.66	0.873	BATCH_30	Measurement	OTDR	0.154
1.335	270.769989	SiO2	2.27	PECVD	ICP	2.77	No_Anneal	1,556.680054	TE	-4.47	45.509998	101	28	2.41	0.381	79.779999	48.82	0.383	1.652	0.768	BATCH_38	Measurement	OTDR	0.165
0.716	571.52002	Air	1.43	PECVD	ICP	4.47	900C_1hr	1,571.849976	TE	3.49	70.620003	65.169998	45.279999	2.427	0.291	66.550003	86.349998	0.056	1.746	0.846	BATCH_11	Measurement	OTDR	0.181
1.906	406.529999	SiO2	4.26	PECVD	Wet Etch	3.83	1000C_1hr	1,519.98999	TE	-2.64	74.419998	101.489998	2.29	2.038	0.86	62.830002	72.889999	0.371	1.75	0.903	BATCH_36	Synthetic	cut-back	0.024
1.78	239.820007	Air	1.12	Sputtering	RIE	4.83	No_Anneal	1,535.280029	TM	4.53	26.280001	167.919998	30.77	12.031	3.464	82.800003	56.84	0.13	1.817	0.903	BATCH_33	Measurement	cut-back	0.085
1.104	507.23999	Air	2.98	LPCVD	Wet Etch	3.4	No_Anneal	1,561.040039	TE	-1.93	70.730003	183.910004	21.73	12.53	4.874	65.169998	84.660004	0.326	1.898	0.724	BATCH_50	Measurement	ring_resonance	0.103
1.258	550.159973	SiO2	1.36	Sputtering	ICP	1.08	900C_1hr	1,568.51001	TM	7.3	42.279999	179.460007	2.23	2.194	4.89	68.709999	57.200001	0.256	1.539	0.718	BATCH_43	Synthetic	cut-back	0.036
1.841	249.860001	SiO2	2.69	LPCVD	RIE	3.53	900C_3hr	1,545.390015	TE	8.97	43.689999	100.410004	46.599998	22.556	4.542	79.769997	83.550003	0.373	1.961	0.87	BATCH_15	Measurement	ring_resonance	0.145
1.971	311.089996	Polymer	4.41	PECVD	Wet Etch	4.05	900C_3hr	1,512.719971	TE	-6.92	31.200001	95.629997	48.41	2.369	0.256	77.07	46.860001	0.095	1.718	0.729	BATCH_50	Synthetic	ring_resonance	0.17
1.786	211.119995	SiO2	3.85	LPCVD	RIE	2.72	No_Anneal	1,569.26001	TM	-7.01	61.5	187.470001	35.720001	18.632	4.866	70.959999	42.48	0.393	1.508	0.746	BATCH_45	Synthetic	ring_resonance	0.036
0.804	380.100006	SiO2	4.02	Sputtering	ICP	4.38	900C_3hr	1,593.27002	TE	-8.32	61.419998	140.850006	14.2	5.814	3.283	47.57	63.68	0.323	1.518	0.785	BATCH_44	Synthetic	ring_resonance	0.194
0.717	304.720001	Air	3.44	LPCVD	Wet Etch	4.91	No_Anneal	1,571.859985	TM	3.91	28.84	105.040001	8.84	4.263	3.931	63.049999	79.849998	0.44	1.855	0.848	BATCH_6	Measurement	cut-back	0.187
1.708	437.980011	Air	2.96	PECVD	ICP	2.81	900C_3hr	1,556.140015	TE	-7.31	54.75	94.709999	45.93	18.466	3.817	69.860001	48.040001	0.272	1.533	0.778	BATCH_36	Measurement	ring_resonance	0.068
1.455	206.570007	Polymer	3.03	PECVD	ICP	3.94	1000C_1hr	1,579.869995	TM	9.45	42.77	195.199997	42.970001	12.183	2.684	44.709999	69.739998	0.134	1.843	0.745	BATCH_40	Measurement	ring_resonance	0.116
0.905	447.959991	Polymer	4.72	Sputtering	RIE	2.77	1000C_1hr	1,562.219971	TE	-2.4	20.549999	135.520004	49.610001	15.899	3.07	88.160004	62.950001	0.28	1.924	0.931	BATCH_31	Measurement	cut-back	0.128
1.314	231.070007	Polymer	4.78	PECVD	Wet Etch	3.74	900C_3hr	1,588.050049	TE	-6.15	65.739998	179.100006	21.360001	7.266	2.737	82.18	51.959999	0.303	1.559	0.845	BATCH_25	Synthetic	cut-back	0.124
1.59	332.929993	Polymer	4.6	LPCVD	ICP	4.81	1000C_1hr	1,503.339966	TE	-2.19	58.720001	181.520004	24.219999	6.966	2.118	82.720001	63.490002	0.033	1.801	0.708	BATCH_9	Measurement	OTDR	0.06
0.599	493.519989	Air	2.06	PECVD	ICP	2.85	900C_3hr	1,567.170044	TE	-9.11	36.919998	83.760002	3.49	2.67	2.341	54.279999	84.910004	0.149	1.908	0.83	BATCH_3	Measurement	OTDR	0.173
0.764	566.25	SiO2	4.65	LPCVD	RIE	1.16	900C_3hr	1,582.329956	TM	2.1	66.830002	131.619995	21.1	1.273	0.275	54.560001	52.900002	0.491	1.893	0.919	BATCH_45	Synthetic	OTDR	0.157
1.297	379.869995	SiO2	3.7	Sputtering	Wet Etch	1.98	900C_3hr	1,552.709961	TM	2.81	25.950001	37.560001	46.630001	18.684	3.744	50.07	82.349998	0.39	1.689	0.922	BATCH_12	Measurement	cut-back	0.125
1.752	484.540009	Air	1.48	PECVD	Wet Etch	3.41	No_Anneal	1,506.089966	TM	-4.18	48.939999	106.900002	23.17	13.152	4.938	61.080002	72.510002	0.33	1.742	0.809	BATCH_33	Synthetic	ring_resonance	0.142
1.247	597.409973	Air	2.28	LPCVD	RIE	0.66	900C_3hr	1,589.790039	TE	-4	62.470001	31.01	29.620001	8.869	2.67	57.75	79.68	0.272	1.872	0.718	BATCH_26	Synthetic	OTDR	0.041
1.616	317.320007	Air	3.17	Sputtering	RIE	3.97	1000C_1hr	1,525.97998	TE	-7.46	64.980003	114.580002	46.25	7.415	1.322	50.110001	84.870003	0.216	1.566	0.92	BATCH_28	Synthetic	ring_resonance	0.091
1.246	228.440002	Air	3.09	Sputtering	ICP	0.86	900C_3hr	1,587.390015	TE	-7.6	79.370003	51.939999	29.43	6.738	1.686	64.099998	85.32	0.119	1.667	0.898	BATCH_24	Measurement	OTDR	0.077
1.537	312.720001	Polymer	3.28	LPCVD	RIE	2.63	900C_1hr	1,581.930054	TE	-3.27	40.049999	37.169998	22.18	5.62	2.17	79.349998	74.830002	0.488	1.753	0.858	BATCH_38	Synthetic	ring_resonance	0.132
1.294	470.559998	Polymer	1.25	PECVD	ICP	4.65	900C_1hr	1,530.900024	TE	4.41	29.23	122.900002	17.49	4.216	1.906	46.689999	81.300003	0.201	1.555	0.813	BATCH_17	Synthetic	cut-back	0.164
1.318	383.5	Air	1.4	PECVD	ICP	1.55	1000C_1hr	1,597.73999	TE	-2.3	78.029999	71.849998	11.2	2.149	0.139	62.330002	53.790001	0.128	1.527	0.741	BATCH_36	Synthetic	ring_resonance	0.108
1.432	409.820007	Polymer	2.93	Sputtering	ICP	2.61	1000C_1hr	1,506.949951	TE	8.18	43.619999	73.050003	47.049999	5.876	0.906	53.209999	42.91	0.091	1.903	0.867	BATCH_49	Synthetic	ring_resonance	0.036
1.872	264.299988	Air	3.24	Sputtering	Wet Etch	3.48	900C_3hr	1,549.209961	TE	2.83	55.169998	117.370003	34.669998	7.08	1.585	54.709999	81.150002	0.034	1.775	0.868	BATCH_6	Measurement	ring_resonance	0.15